Plasma Science and Technology Division

The Plasma Science and Technology Division provides a forum for those interested in the entire range of plasma science and technology, extending from fundamental modeling studies to manufacturing applications. Common themes at PSTD-supported conferences include: * Plasma-surface and ion-surface interactions * Plasma diagnostics and modeling * Plasma sources and systems * Pattern transfer and feature profile evolution * Plasma physics, chemistries and processes * Plasma-enabled new technologies

Plasma Science and Technology Division's Plasma Prize

The Plasma Prize is to be awarded for outstanding contributions to the field of plasma science and technology.
Information on nominations for finalists can be found here.

John Coburn and Harold Winters Student Award in Plasma Science and Technology 

In 1994, the Plasma Science and Technology Division established the Coburn and Winters Award in honor of John Coburn and Harold Winters. Coburn and Winters have made pioneering contributions to the field of plasma science, especially in plasma processing and plasma surface interactions. Their work has provided inspiration for countless students entering the field of plasma science and they have enhanced the graduate experiences of students by both examples and mentorship.

The Coburn and Winters Award Winner is selected every year at the AVS International Symposium from a number of pre-selected finalists on the basis of the oral presentation about their work, the quality of the research, the clarity of the presentation, and the potential for the research to advance the field of plasma science. The award consists of a $1000 cash award. The other finalists receive a merit award of $500. Information on nominations for finalists can be found here.

Technical programs

The PSTD supports advances in plasma science and technology through sessions, tutorials and topical conferences at the annual AVS International Symposium and Exhibition, and through a number of cosponsored topical conferences throughout the year.

Depending on the theme of a particular session at the International Symposium, it can be jointly organized by the PSTD and other divisions with overlapping interests, such as the Surface Science Division, the Applied Surface Science Division, the Nanoscale Science and Technology Division, the Electronic Materials and Processing Division, and the Manufacturing Science and Technology Topical Group.

AVS 58th International Symposium & Exhibition

October 30 - November 4, 2011

Albuquerque, New Mexico, USA 

The Plasma Science and Technology Division (PS) program highlights state-of-the-art advances in plasma research, ranging from fundamental studies of plasma physics and chemistry to new applications in plasma processing.  Abstracts describing novel research are being solicited in the areas of plasma etching and deposition, plasma modeling, plasma-surface interactions, plasma sources, 3-D integration (including TSV and MEMS), and plasma diagnostics, sensors and control. One may also choose to present emerging work that focuses on atomic layer or neutral beam etching, atmospheric pressure plasmas, microplasmas, liquids and multiphase discharges, medical and biological applications of plasma science, and plasma applications in aerospace and combustion. After a successful first year, we are excited to continue offering a session on “Plasma Processing for Photovoltaics” in conjunction with the Energy Frontiers Topical Conference.  In addition to the oral sessions, abstracts may be submitted to the poster session, which provides an excellent opportunity for one-on-one discussion of new results with colleagues.