International Semiconductor Characterization Workshop

January 30-February 2, 1995

Summary Report:

The AVS Manufacturing Science and Technology Group co-sponsored a workshop at NIST on January 30-February 2 on "Semiconductor Characterization: Present Status and Future Needs". This very successful Workshop had over 250 participants from the industrial, university, and government communities. One primary component of the Workshop was the integration of metrology, sensor, control, and application perspectives, which provided tremendous tutorial and research stimulation value. A second component highlighted the importance of Cost-of-Ownership considerations for assessing the return on investment in metrology tools and techniques for manufacturing. Yet another point for implementation was the continuing need to include suppliers of characterization instruments into collaborations for technology and manufacturing techniques development. Proceedings from this event will be published by AIP in hard-cover form by late summer 1995. For information on receiving this proceedings, contact Mike Hennelly at AIP, 516-576-2474.

Conference Announcement and Agenda

The Semiconductor Electronics Division of the National Institute of Standards and Technology (NIST) will host the four-day International Workshop on Semiconductor Characterization: Present Status and Future Needs from January 30 through February 2, 1995, at NIST Headquarters in Gaithersburg, Maryland. The Workshop will bring together industry leaders, scientists, and engineers interested in various aspects of the characterization of semiconductor materials, processes, and devices to review the major measurement needs facing the semiconductor industry.

Invited speakers and poster presenters will discuss the latest advancements in silicon process development and manufacturing; analytical technology and metrology requirements for geometries of 0.3 micrometers and beyond; starting materials, gate dielectrics, and process simulation; interconnects and failure analysis; critical analytical methods; in-situ methods, real-time diagnostics, analysis, and control for silicon and compounds; and frontiers in compound semiconductors. Three panel sessions on related issues are being organized by Semiconductor Equipment and Materials International (SEMI).

On Friday, February 3, a separate strategic planning session for compound semiconductors, jointly sponsored by SEMI and NIST, is scheduled.

For registration information, contact: 

	Jane Walters, NIST
	Phone:  (301) 975-2050
	Fax: (301) 948-4081
	e-mail: walters@apollo.eeel.nist.gov.

Technical contact for the Workshop: 

	David G. Seiler, NIST

	Phone:  (301) 975-2081

	e-mail: seiler@sed.eeel.nist.gov

The registration deadline is January 16, 1995. Hotel registration deadline is January 9, 1995.

This Workshop is being co-sponsored by: ARPA, SEMATECH, NIST, ARO, U.S. Department of Energy, NSF, SEMI, and AVS Manufacturing Science and Technology Group.

INTERNATIONAL WORKSHOP ON SEMICONDUCTOR CHARACTERIZATION: PRESENT STATUS AND FUTURE NEEDS

Confirmed Invited Speakers:

Monday

Tuesday

Wednesday

Thursday

Panel Sessions

Monday

Tuesday Wednesday

FRIDAY'S STRATEGIC PLANNING SESSION FOR COMPOUND SEMICONDUCTORS:

Confirmed Invited Speakers:

Panel Discussion:

Should the Compound Semiconductor Industry Speak in Unison about Its Future? And, if so, how would this be accomplished?

Last modified March 5, 1995.