SYMPOSIUM ON

Process Control, Diagnostics, and Modeling
in
Semiconductor Manufacturing I

Spring Electrochemical Society Meeting Reno, Nevada 21 - 26 May 1995

This Symposium is part of the Spring Electrochemical Society Meeting. It will be held in Reno, Nev May 21-26, 1995. The SEMATECH control PTAB and modeling PTAB meetings will be held in conjunction with the symposium to reduce industrial travel. The expected mixture of university and industrial participants will make for an exciting symposium. Note that the due date for Extended Abstracts has been extended to Dec. 15. If you would like to submit a paper, please e-mail butler@spdc.ti.com your postal address and I will send you the instructions and forms. The forms are also available in The Electrochemical Society's Interface (bulletin).

Schedule
Other Information

Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing I

This symposium is aimed at bringing together the technical community involved in various aspects of process control, process diagnostics, and modeling in semiconductor manufacturing. Topics relating to automation, i.e., computer controlled feedback and feedforward of information for controlling a single process, or a series of processes, will also be highlighted. Processes of interest include, but are not limited to, CVD, PVD, PECVD, etching, RTP, cleaning, and lithography. Sessions will be organized around coherent subjects in order to facilitate useful discussions and focus on appropriate solutions to problems.

Original technical work or substantial review papers are solicited. Suggested topics include control methodologies, modeling approaches, and in situ measurement techniques. Papers focusing on the use of fundamental equipment/process models to generate control strategies and controller models are also requested. Other appropriate themes are the relationship between modeling and control, calibration techniques, and automation issues. Papers focusing on application to commercial tools are also desirable. Publication of a proceedings volume is planned. Papers published in a proceedings volume may also be submitted to the JOURNAL, but must be received no later than six months after the date of the symposium at which the paper was presented.

Authors submitting abstracts are requested to include in their extended abstracts sections on objective, approach, results, and conclusion. A clear statement of the problem being solved is advisable. A brief description of the manufacturing process is also appropriate. Abstracts, suggestions, and inquiries should be sent to one of the symposium organizers:

M. Meyyappan, Scientific Research Associates, Inc.,
PO Box 1058,
Glastonbury, CT 06033,
Phone: (203)659-0333, Fax: (203)633-0676,
e-mail: meyya@srai.com;

D. J. Economou, Dept. of Chemical Eng.,
University of Houston, TX 77204-4792,
Phone: (713)743-4320, e-mail: economou@uh.edu

S. W. Butler, Texas Instruments,
PO Box 655012, MS 944,
Dallas, TX 75265,
Phone: (214)995-4241, e-mail: butler@spdc.ti.com

Detailed Program Information

PROCESS CONTROL, DIAGNOSTICS, AND MODELING IN SEMICONDUCTOR MANUFACTURING I

Dielectric Science and Technology/Electronics

Monday, May 22, 1995
Capitol Room 3, Convention Level

PROCESS CONTROL, DIAGNOSTICS, AND MODELING IN SEMICONDUCTOR MANUFACTURING I

Dielectric Science and Technology/Electronics

Tuesday, May 23, 1995
Capitol Room 3, Convention Level

R. Mundt, Chairman; M. Dalvie, Vice-Chairman