
Manufacturing Science and Technology Group Program
at AVS 42nd National Symposium
Minneapolis, Minnesota
October 16-20, 1995
ABSTRACT DEADLINE: MAY 5, 1995, AT AVS N.Y. OFFICE
Conference Objective and Overview
Following two successful Topical Conferences on Manufacturing Science
and Technology, the new AVS MSTG will sponsor a 4-day program as a
regular part of the AVS 42nd National Symposium to be held at the
Minneapolis Convention Center in Minneapolis, Minnesota, on October
16-20, 1995.
The conference provides a forum for interaction among the
manufacturing and research communities. It highlights research within
the AVS that has substantial relevance to manufacturing and it
provides the research community with perspective on manufacturing
issues that are opportunities for research. The focus of the
conference is semiconductor manufacturing and research, and has the
following confirmed invited speakers and session topics.
Invited Overview Session: Issues in Manufacturing Research
- "The SIA National Technology Roadmap for Semiconductors"
Thomas E. Seidel, SEMATECH
- "The 300mm Factory"
Barry C. Johnson, Motorola Inc.
- "The Vanishing Process Window; Lithography Challenges for
the Year 2000"
Karen H. Brown, SEMATECH
- "Chemical Mechanical Planarization for ULSI Device Fabrication;
Research Opportunities and Manufacturability Challenges"
Frank B. Kaufman*, Thomas Sandwick**, and Matt Rutten***
*IBM T. J. Watson Research Center
**IBM Microelectronics, Burlington, VT
***IBM Microelectronics, East Fishkill, NY
- "The Availability of Sensors for Process Monitoring
and Control; The View from SEMATECH"
Jimmy Hosch, SEMATECH
Defects and Contamination
- "Application of Near Field Optical Microscopy to Semiconductor IC
Defect Analysis"
Walter Duncan, Texas Instruments
Process and Equipment Modeling
- "Process and Equipment Modeling and Simulation for
the Semiconductor Industry"
Marius Orlowski, Motorola
- "Process Equipment Simulations for Semiconductor Process
Development"
Sadasivan Shankar, Intel Corp.
Advanced Manufacturing Equipment (2 sessions)
- "Technology Trends toward High Vacuum Levels in Advanced
Microelectronics Manufacturing"
Izumi Nakayama, ULVAC Technologies, Inc.
- "Vacuum Issues in Ion Beam Processing for Semiconductor
Manufacturing"
Michael Current, Applied Materials
- "Standardization Challenges for Integrated Processing Technologies"
Chris Werkhoven, ASM International
Diagnostics, Sensors and Control (Joint with PST)
- "Integrated Process Control; A Strategy for Technology and
Manufacturing Implementation"
Dariush Rafinejad, LAM Research Corporation
High Density Plasmas; Applications (Joint with PST)
- "High Density Plasmas; Applications in ULSI Pattern Transfer"
JTC Lee, AT&T Bell Laboratories
Plasma Issues in Submicron Patterning (Joint with PST)
In addition, the National Symposium will include several other
features of interest to the manufacturing research community,
including: a Topical Conference on Flat Panel Displays, a broader
focus area on Sensors, Diagnostics, and Process Control, and
Divisional Programs in Plasma Science and Technology, Electronic
Materials and Processes, Thin Films, Vacuum Technology, and others.
Manufacturing Science and Technology Program Committee
- Overall Chair:
L. Cecchi, (Sandia)
- Defects and Contamination:
A. Diebold, (SEMATECH); C. R. Brundle, (C. R.
Brundle Assoc.); A. Testoni, (DEC)
- Process and Equipment Modeling:
M. Kushner, (U. Ill.); G. Garcia,
(Intel); A. Ghanbari, (MRC); H. Anderson, (UNM);
M. Hartig, (SEMATECH)
- Advanced Manufacturing Equipment:
K. Maxwell, (SEMATECH); C. Whitman,
(CVC); R. Powell, (Varian);
D. Hartman, (Motorola)
- Diagnostics, Sensors and Control:
G. Barna, (TI); A. Wendt, (U. Wisconsin)
For Further Information
MSTG abstracts should be submitted directly to the National Symposium.
To request the Call for Papers, including submission information, or a
Preliminary Program, contact the AVS at (212) 248-0200, e-mail:
avsnyc@vacuum.org. For information concerning the Manufacturing
Science and Technology program, contact MSTG Program Chair Linda
Cecchi at (505) 844-3860, e-mail: cecchilm@sandia.gov
For further information on the
Manufacturing Science and Technology
Group, contact Jeff Coriale at (919) 515-5053 or Gary Rubloff at (919)
515-6139, or e-mail: avs_mstg@vacuum.org
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